中英
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reactive ion etching中文是什么意思
- 中文翻譯
- 造句
- 無功離子蝕刻
- reactive adj. 1.反動的，倒退的，復古的。 2.反應的；反作 ...
- ion n. 【物理學】離子。 positive [negati ...
- etching n. 1.蝕刻法；蝕刻(銅)版畫；蝕鏤術。 2.蝕刻畫， ...
- etching reactive ion 反應離子蝕刻法
- etching, reactive ion (rie) 反應離子蝕刻法
- reactive ion beam etching 反應離子束刻蝕
- reactive ion etching rie 反應離子刻蝕
- triode reactive ion etching system 三極型反應性離子蝕刻系統(tǒng)
- hexode type reactive ion etching system 六角柱型反應性離子蝕刻系統(tǒng)
- reactive etching 反應侵蝕; 反應性腐蝕
- ion etching 離子刻蝕; 離子蝕刻法
- reactive sputter etching 反應濺射刻蝕
- reactive sputter etching system 反應性濺鍍蝕刻系統(tǒng)
- high frequency ion etching 高頻離子腐蝕
- ion beam etching 離子束腐蝕
- ion beam etching system 離子束蝕刻系統(tǒng)
- ion bombardment etching 離子轟擊浸蝕
- ion enhanced etching 離子增強腐蝕
- ion etching chamber 離子蝕刻室
- ion etching equipment 離子刻蝕設備
- ion etching machine 離子蝕刻機
- ion etching station 離子束腐蝕機
- ion sputter etching 濺射刻蝕
- icp reactive ion etcher 電感耦合活性離子蝕刻系統(tǒng)
- reactive ion beam 活性離子束
- Narrow gap reactive ion etching system
狹窄間隙反應性離子蝕刻系統(tǒng) - Reactive ion etching system rie system
反應性離子蝕刻系統(tǒng) - The reactor is capable of working in the rie ( reactive ion etching ) mode and also in the plasma etching mode
反應腔擁有在rie (反應離子刻蝕)模式和等離子刻蝕模式下工作的能力。 - Yak hairs were treated by the microwave electron cyclotron resonance plasma reactive ion etching ( ecr - rie ) equipment to improve its property of weave
摘要采用微波電子回旋共振等離子體反應離子刻蝕( ecr - rie )裝置對牦牛毛纖維進行表面改性，從而改善牦牛毛的可紡性。 - Kionix manufactures inertial sensors using plasma micromachining , a highly - refined , proprietary , deep reactive ion etch drie fabrication technology . the resulting products are ultra - small mechanical elements integrated with electronics to create microelectromechanical systems mems
Kionix的慣性sensor采用的plasma微機電制程,是一種經高度改良且有獨家專利制程,使產品的機械結構部份做到最小并同時與電子電路結合形成一先進的微機電產品 - By studying and using conventional 1c process in combination with electron beam lithography ( ebl ) , reactive ion etching ( rie ) and lift - off process , several efficient results are produced : semiconductor and metal nano - structures are fabricated ; the matching problem of photolithography and electron beam lithography is well solved ; the process efficiency is improved ; the process is offered for the controlled fabrication of nano - structures by repetitious process testing ; several nano - structures such as si quantum wires , si quantum dots , double quantum dot structures and tri - wire metal gate are firstly fabricated by using ebl and rie processes
研究利用常規(guī)的硅集成電路工藝技術結合電子束光刻，反應離子刻蝕和剝離等技術制備半導體和金屬納米結構，很好地解決了普通光刻與電子束光刻的匹配問題，提高了加工效率，經過多次的工藝實驗，摸索出一套制備納米結構的工藝方法，首次用電子束光刻，反應離子刻蝕和剝離等技術制備出了多種納米結構(硅量子線、量子點，雙量子點和三叉指狀的金屬柵結構) 。 - A large number of attempt and painstaking experiment have been done in this paper according to existing project . we also do lots of chemical and electrochemical etching research in material of lab6 , and find out three kind of methods to produce the field emitting cold cathode including reactive ion etching ( rie ) with oxygen , wet process etching and electrochemical etching . through produce some field emitting cold cathode single tip including lab6 field emitting cold cathode , molybdenum field emitting cold cathode , tungsten field emitting cold cathode , tungsten rhenium field emitting cold cathode , molybdenum covered with lab6 film field emitting cold cathode
而且,目前可借鑒的參考文獻較少,圍繞著前人做過的方案,本文做了大量工作,在已有文獻介紹的基礎上,結合原有的理論和實踐基礎,摸索出了包括高溫氧作用反應離子( rie )刻蝕法、濕法腐蝕法和電化學腐蝕法在內的三種制備工藝,運用電化學腐蝕工藝成功制備了單尖的六硼化鑭場發(fā)射冷陰極尖錐、鉬場發(fā)射冷陰極尖錐、鎢場發(fā)射冷陰極尖錐、鎢錸合金場發(fā)射冷陰極尖錐以及有六硼化鑭薄膜覆蓋的鉬場發(fā)射冷陰極尖錐。
- reactive ion etchingとは意味：反応性｛はんのうせい｝イオン?エッチング◆【略】RIE
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